A low amount of AlOx was successfully deposited on an unordered. mesoporous SiO2 powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water. The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed. The reactor temperature was varied between 75. https://www.shopnyples.shop/product-category/calendar/